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Murrae Bowden and Larry F. Thompson T he inventions of Bowden and Thompson for Bell Laboratories were critical to establishing electron beam lithography as a commercially viable technique for fabricating photomasks. They pioneered the field of high sensitivity electron-beam resists materials that are used to fabricate advanced integrated circuit masks and fine line devices. Their initial work established the fundamental physical principles and the mechanistic chemical understanding in the design of radiation sensitive polymers used as high resolution resists for electron beam X-ray and deep UV lithography. Bowden and Thompson's contributions over a period of 20 years encompasses every facet of resist technology including molecular design, synthesis, lithographic processing, pilot scale-up and licensing and support activities associated with commercially important resists as COP, PBS, GMC, NPR and PBTMSS. Their creativity also established the accepted methodology for the molecular design of polymeric materials for resist application that has been adopted by other research labs around the world. Together, they hold eight patents.